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Physics of Semiconductor Devices, 3rd Edition

ISBN: 9780471143239

Autor: Dr. Simon M. Sze

Editora: WILEY.

Número de Páginas: 832

Idioma: Inglês

Data Edição: 2006

121,37 €134,86 €
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This classic reference provides detailed information on the underlying physics and operational characteristics of all major bipolar, unipolar, special microwave, and optoelectronic devices. It integrates nearly 1,000 references to important original research papers and review articles, and includes more than 650 high-quality technical illustrations and 25 tables of material parameters for device analysis. In this third edition, all major topics of contemporary interests will be either be added or expanded. It will include problems and examples, as well as a solutions manual.
Introduction. Part I Semiconductor Physics. Chapter 1 Physics and Properties of Semiconductors-A Review. 1.1 Introduction. 1.2 Crystal Structure. 1.3 Energy Bands and Energy Gap. 1.4 Carrier Concentration at Thermal Equilibrium. 1.5 Carrier-Transport Phenomena. 1.6 Phonon, Optical, and Thermal Properties. 1.7 Heterojunctions and Nanostructures. 1.8 Basic Equations and Examples. Part II Device Building Blocks. Chapter 2 p-n Junctions. 2.1 Introduction. 2.2 Depletion Region. 2.3 Current-Voltage Characteristics. 2.4 Junction Breakdown. 2.5 Transient Behavior and Noise. 2.6 Terminal Functions. 2.7 Heterojunctions. Chapter 3 Metal-Semiconductor Contacts. 3.1 Introduction. 3.2 Formation of Barrier. 3.3 Current Transport Processes. 3.4 Measurement of Barrier Height. 3.5 Device Structures. 3.6 Ohmic Contact. Chapter 4 Metal-Insulator-Semiconductor Capacitors. 4.1 Introduction. 4.2 Ideal MIS Capacitor. 4.3 Silicon MOS Capacitor. Part III Transistors. Chapter 5 Bipolar Transistors. 5.1 Introduction. 5.2 Static Characteristics. 5.3 Microwave Characteristics. 5.4 Related Device Structures. 5.5 Heterojunction Bipolar Transistor. Chapter 6 MOSFETs. 6.1 Introduction. 6.2 Basic Device Characteristics. 6.3 Nonuniform Doping and Buried-Channel Device. 6.4 Device Scaling and Short-Channel Effects. 6.5 MOSFET Structures. 6.6 Circuit Applications. 6.7 Nonvolatile Memory Devices. 6.8 Single-Electron Transistor. Chapter 7 JFETs, MESFETs, and MODFETs. 7.1 Introduction. 7.2 JFET and MESFET. 7.3 MODFET. Part IV Negative-Resistance and Power Devices. Chapter 8 Tunnel Devices. 8.1 Introduction. 8.2 Tunnel Diode. 8.3 Related Tunnel Devices. 8.4 Resonant-Tunneling Diode. Chapter 9 IMPATT Diodes. 9.1 Introduction. 9.2 Static Characteristics. 9.3 Dynamic Characteristics. 9.4 Power and Efficiency. 9.5 Noise Behavior. 9.6 Device Design and Performance. 9.7 BARITT Diode. 9.8 TUNNETT Diode. Chapter 10 Transferred-Electron and Real-Space-Transfer Devices. 10.1 Introduction. 10.2 Transferred-Electron Device. 10.3 Real-Space-Transfer Devices. Chapter 11 Thyristors and Power Devices. 11.1 Introduction. 11.2 Thyristor Characteristics. 1 1.3 Thyristor Variations. 11.4 Other Power Devices. Part V Photonic Devices and Sensors. Chapter 12 LEDs and Lasers. 12.1 Introduction. 12.2 Radiative Transitions. 12.3 Light-Emitting Diode (LED). 12.4 Laser Physics. 12.5 Laser Operating Characteristics. 12.6 Specialty Lasers. Chapter 13 Photodetectors and Solar Cells. 13.1 Introduction. 13.2 Photoconductor. 13.3 Photodiodes. 13.4 Avalanche Photodiode. 13.5 Phototransistor. 13.6 Charge-Coupled Device (CCD). 13.7 Metal-Semiconductor-Metal Photodetector. 13.8 Quantum-Well Infrared Photodetector. 13.9 Solar Cell. Chapter 14 Sensors. 14.1 Introduction. 14.2 Thermal Sensors. 14.3 Mechanical Sensors. 14.4 Magnetic Sensors. 14.5 Chemical Sensors. Appendixes. A. List of Symbols. B. International System of Units. C. Unit Prefixes. D. Greek Alphabet. E. Physical Constants. F. Properties of Important Semiconductors. G. Properties of Si and GaAs. H. Properties of SiO, and Si3N. Index.
Dr. Simon M. Sze received his B. S. degree from the National Taiwan University in 1957, M. S. degree from the University of Washington in 1960, and Ph. D. from Stanford University in 1963, all in Electrical Engineering. He is UMC Chair Professor, NCTU, and President, National Nano Device Laboratories. Since 1967, he has given lecturers or served as a Visiting Professor to many academic institutions including the University of Cambridge, the University of Delft, Hong Kong University, the University of Peking, Stanford University, and the University of Tokyo. Dr. Sze has made fundamental contributions to both device physics and technology that have shaped the understanding and advancement of the microelectronic industry.  He received the Sun Yat-sen's Award (1969), the IEEE J. J. Ebers Award (1991), the Distinguished National Chair Professor Award (1996-1999, 1999-2002), and the National Science and Technology Prize (1998). He is a Fellow of IEEE (elected in 1977), a member of the Academia Sinica (1994, ROC), and a member of the National Academy of Engineering (1995, USA). Kwok K. Ng received his Ph.D. degree from Columbia University in 1979 and B.S. degree from Rutgers University in 1975, both in Electrical Engineering. He worked at with Bell Laboratories, Lucent Technologies for nearly 25 years, engaging in different aspects of Si MOS, Si and SiGee bipolar, and compound semiconductor devices and technologies. Dr. Ng has been active in contributing journal papers, conference talks, book chapters, and holds various patents. He is a Publication Committee member of the IEEE Electron Devices Society, a Distinguished Lecturer of the latter, and a former Associate Editor of IEEE Electron Device Letters.

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